Veeco Instruments Inc. of Plainview, New York USA, reported that the company exported several TurboDisc® EPIK® 868 Gallium Nitride (GaN) Metal Organic Chemical Vapor Deposition (MOCVD) systems to multiple Chinese LED makers. The LED producers intend to use the EPIK 868 MOCVD systems to fabricate LEDs for solid state lighting applications.
Veeco claims that compared to previous generations of GaN MOCVD systems, the EPIK 868 MOCVD system facilitates cost per wafer savings of more than 20%. The company also asserts that the EPIK 868 offers the combined advantages of low maintenance costs, best operating uptime, and best-in-class wafer uniformity. In addition, the system boasts a compact architecture that the company claims to be the industry’s best footprint efficiency for high-volume LED production.
Company Based EPIK 868 on TurboDisc Technology
Veeco, based the MOCVD system on its TurboDisc technology. According to Veeco, the four reactor platform gives customers a 35 percent footprint reduction and the highest productivity compared to the competition. Furthermore, the wafer carrier capacity can be raised for greater throughput per batch.
William J. Miller, Ph.D., president of Veeco, commented, “With the EPIK 868, our Chinese customers can continue to take advantage of Veeco’s leading-edge technology development and world-class service offerings at a significantly lower cost of ownership.”
“The EPIK 868 is built upon a production-proven TurboDisc platform with over one-thousand chambers installed worldwide providing the highest operating stability and efficiency for our customers,” added Peo Hansson, Ph.D., senior vice president and general manager, Veeco MOCVD Operations. “Not only will the new EPIK 868 system improve our customers’ productivity and cost of ownership, but it will also provide a highly reliable, leading-edge production tool from the MOCVD technology world leader.”