Pallidus, Inc. announced its proprietary M-SiC™ material and technology platform. According to Pallidus, its M-SiC technology can deliver cost/performance parity compared to silicon devices used in the power device market. Pallidus says that the ability to achieve cost/performance parity with silicon devices will increase market penetration by up to six times. However, the company notes that the single biggest obstacle to SiC market expansion is the cost and availability of high-quality silicon carbide wafers.
“Despite its superior performance, high cost is the key obstacle for the full adoption of SiC power devices. In particular the SiC wafer contributes up to 60% of the final cost. Technology that can drive a major cost reduction will immediately and significantly accelerate SiC technology adoption and penetration,” commented Dr. Hong Lin, Technology & Market Analyst at Yole Developpement.
Pallidus says its M-SiC Technology Can Accelerate SiC Adoption
Pallidus says its M-SiC technology is the solution. The M-SiC technology is compatible with current manufacturing processes. The company insists that M-SiC reduces the production cycle and enhances both the overall yield and quality of silicon carbide wafers. Furthermore, the company claims that with this significant reduction in wafer defects, M-SiC can make a meaningful improvement to overall device yield. Pallidus claims that taken together, M-SiC can deliver up to a 50% reduction in production costs for both wafers and devices. Also, the company says that leveraging M-SiC technology requires a lower capital investment.
Andrei Maltsev, President AGP Technologies LLC stated, “The very high purity and form of M-SiC has allowed us to grow the highest quality 4H-SiC 6-inch wafers with the lowest defect density we have ever seen.”
Professor Peter Wellman of the University of Erlangen, Germany, stated, “M-SiC exhibits exceptional opportunity for the growth of the highest quality crystals. In addition, the capability to produce custom shaped ‘charges’ enables the never before seen opportunity to achieve ideal system performance.”