Oxford Instruments Supplies Plasma Etch Systems for First Mass VCSEL Production Fabrication Facility in China, Sino-semic

Oxford Instruments Plasma Technology (OIPT), reported that Chinese vertical cavity surface emitting laser (VCSEL) production firm, Sino-semic, selected OIPT’s Cobra® plasma etch systems for their production facilities in Taizhou City. Sino-semic, the first all-Chinese developer and maker of VCSELs for facial recognition, noted that the plasma etch system’s process capability and Oxford Instrument’s local support were critical factors in their decision to adopt the inductively coupled plasma (ICP) etch Cobra systems.

Li Jun, Vice General Manager at Sino-semic commented, “We chose Oxford Instruments to supply our ICP etch equipment because they offer cutting-edge plasma processing systems and unrivaled process support, which will be invaluable to us during our production scheme.”

Oxford Instruments designed the Cobra process solutions to support leading-edge device applications including the fabrication of lasers, RF, power electronics, and advanced LEDs.

“VCSEL based devices are entering another exciting phase of growth,” stated Richard Pollard, Managing Director at OIPT, “We are thrilled to be providing our VCSEL processing solutions to a pioneering production manufacturer such as Sino-semic.”