Nanjing University located in China ordered an MBE system from Veeco Instruments of Plainview, New York USA. The order is for the GENxplor R&D molecular beam epitaxy (MBE) system. The university expects to receive the system in second-quarter 2016. Veeco says that the GENxplor system is the top-selling MBE system worldwide since its introduction in August 2013.
Nanjing University intends to use the system for its Materials Science and Engineering research program, led by professor Hong Lu. According to Veeco, the system will enable the epitaxial growth of III-V semiconductor materials for applications such as optoelectronic devices and thermoelectric energy conversion.
The GENxplor system can deposit epilayers on substrates up to 3″ in diameter. The system can be used for a wide variety of applications such as developing fiber lasers for material processing, high-speed transistors, and wireless technology. Veeco says that its single-frame design integrates all vacuum hardware with on-board electronics, making it up to 40% smaller than other MBE systems.
“The open-architecture design and superior technology of the GENxplor system is a welcome addition to the research facility of National Laboratory of Solid State Microstructures and College of Engineering and Applied Sciences at Nanjing University,” says Lu.
Gerry Blumenstock, VP of Veeco’s MBE Operations commented, “After launching the system at the 2013 China MBE Conference, we are excited that Nanjing University, a leading materials science and condensed matter physics research university, is the first customer to install a GENxplor in China.”