Successful Oxford Instruments Seminar in Shanghai attracts industry and academia
Oxford Instruments - Press Releases - As issued by company
April 23, 2012... The recent Nanoscale Plasma Processing Seminar organised by Oxford Instruments in Shanghai attracted over 70 attendees from both academia and production, from China and Taiwan. The company organises these events worldwide several times per year, and has previously co-hosted with prestigious organisations such as the IOS-CAS in Beijing, LBNL, Caltech and Cornell in the USA, Universities of Southampton and Glasgow in the UK, and TU/e in the Netherlands. As a leader in systems and processes for plasma etch and deposition, the company was honoured that so many invited guest speakers participated, all specialists in their field from China, Taiwan and Europe. Process and Applications experts from Oxford Instruments Plasma Technology gave a number of talks on the company’s technologies and process solutions.
These events held by Oxford Instruments aim to encourage interest in developments within industrial and research communities using Plasma and Ion Beam Etch and Deposition process techniques. They are an ideal means for participants to learn more about latest techniques and findings in an informal atmosphere where participation and interaction are encouraged. Talks included Atomic Layer Deposition (ALD), Photovoltaics (PV), Deep Silicon Etch and Ion Beam technologies during the full one day programme. Guest speakers included: Prof Erwin Kessels, University of Eindhoven (TU/e), Netherlands; Chu Ann-Kuo, Professor of Department of Photonics, National Sun Yat-sen University, Taiwan; Dr. Zhenghua YE, SITP (Shanghai Institute of Technology Physics); Dr. Juncong SHE, Sun Yat-Sen University, China; and Jerry Wang, Manager of Microsystems Technology Center, ITRI, Taiwan.
Mark Vosloo, Sales, CS and Marketing Director, Oxford Instruments comments, “We were pleased to have attracted such a large and high calibre audience to this Seminar in Shanghai, and are extremely honoured that so many distinguished guest speakers gave their time to speak about their work in Plasma Processing. Our Seminars offer a fantastic opportunity for the wider Plasma Processing community to meet andshare their experiences, and to learn more from leading international experts in their field.”
More Seminars are planned worldwide for 2012.
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