New Managing Director for Oxford Instruments Plasma Technology
Source/Type: Oxford Instruments - Press Releases - As issued by company

April 5, 2012... Oxford Instruments Plasma Technology has just announced the appointment of Dan Ayres to Managing Director with immediate effect. Dan previously held the position of General Manager at the company, and prior to this was Operations Director. With over 10 years experience within the Oxford Instruments Group, Dan has held roles in the fields of Operations, Product Management and Project Management.

Dan Ayres will report to Jonathan Flint, CEO of Oxford Instruments plc, who comments, “Our business strategy demands an organisation that can meet the challenge of expanding markets, new products, and growing numbers of customers and employees. Dan’s new appointment will ensure that Oxford Instruments Plasma Technology continues its current growth plans, and I am confident that with Dan heading the strong Executive Team in place at the company, this will be achieved.”

“I am delighted to have this opportunity to lead our highly skilled team and I look forward to working with them to build on the success of recent years”, comments Dan Ayres, “In line with our strategic plan we will focus on innovating improved etch, deposition and growth solutions to meet our customers’ needs for new systems, continuous performance improvement and after-sales support. We will support our focus on innovation by investing in improved business processes to ensure we deliver a healthy and growing business for our employees, shareholders and other stakeholders”
At the same time, Mark Vosloo, Sales & Customer Support Director has taken over responsibility for all customer facing functions including strategic marketing and holds the new title Sales, CS & Marketing Director. This promotion will ensure that Oxford Instruments Plasma Technology aligns even more effectively with our customers and the provision of high technology products and services geared to their specific requirements.
- Ends -
Issued for and on behalf of Oxford Instruments Plasma Technology Limited

For further information and electronic copies of the images please contact:
Susie Williams
Marketing Communications Manager
Oxford Instruments Plasma Technology
Email: susie.williams@oxinst.com
Tel: +44 (0)1934 837000
Fax: +44 (0)1934 837001

About Oxford Instruments plc
Oxford Instruments designs, supplies and supports high-technology tools and systems with a focus on research and industrial applications. It provides solutions needed to advance fundamental physics research and its transfer into commercial nanotechnology applications. Innovation has been the driving force behind Oxford Instruments' growth and success for over 50 years, and its strategy is to effect the successful commercialisation of these ideas by bringing them to market in a timely and customer-focused fashion.
The first technology business to be spun out from Oxford University over fifty years ago, Oxford Instruments is now a global company with over 1900 staff worldwide and is listed on the FTSE250 index of the London Stock Exchange (OXIG). Its objective is to be the leading provider of new generation tools and systems for the research and industrial sectors.
This involves the combination of core technologies in areas such as low temperature, high magnetic field and ultra high vacuum environments, Nuclear Magnetic Resonance, X-ray, electron and optical based metrology, and advanced growth, deposition and etching.
Oxford Instruments aims to pursue responsible development and deeper understanding of our world through science and technology. Its products, expertise, and ideas address global issues such as energy, environment, security and health.

About Oxford Instruments Plasma Technology
Oxford Instruments Plasma Technology offers flexible, configurable process tools and leading-edge processes for the precise, controllable and repeatable engineering of micro- and nano-structures. Our systems provide process solutions for nanometre layer epitaxial growth of compound semiconductor material, etching of nanometre sized features and the controlled growth of nanostructures. These solutions are based on core technologies in plasma-enhanced deposition and etch, ion-beam deposition and etch, atomic layer deposition and hydride vapour phase epitaxy. Products range from compact stand-alone systems for R&D, through batch tools and up to clustered cassette-to-cassette platforms for high-throughput production processing.

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