Veeco Launches TurboDisc K465i GaN MOCVD System
Source/Type: Reported News

Author: CompoundSemi News Staff

January 20, 2010... Veeco has introduced the new TurboDisc K465i gallium nitride (GaN) Metal Organic Chemical Vapor Deposition (MOCVD) System for the production of high-brightness light- emitting diodes (HB LEDs). Veeco reports that its beta site customers rapidly qualified the K465i for volume production, and the Company has received orders for the system from multiple LED customers throughout the Asia Pacific region. According to the company the system is based on its production-proven K-Series platform and it combines high productivity with the capability to drive LED yields approaching 90 percent in a 5nm bin. Veeco says that the fully automated system requires only a short recovery period after maintenance and enables higher productivity and reduced cost of ownership compared to competitive tools.

According to Bill Miller, Ph.D., Senior Vice President, General Manager of Veeco’s MOCVD business, “With superior wavelength uniformity and excellent run-to-run repeatability, the K465i extends Veeco’s lead in capital efficiency – the number of good wafers per day for each capital dollar – for high volume LED manufacturers. We are extremely pleased that our beta site customers achieved world-class results in a very short period of time. Industry interest in the K465i is strong.”

John R. Peeler, Veeco’s Chief Executive Officer, added, “The K-Series is a robust, reliable, multi-generational MOCVD platform that is in production at more than 80% of the world’s key LED manufacturers.” Company News Release

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