Oxford Instruments Launches CrystalFlex HVPE Reactor
Source/Type: Reported News

Author: CompoundSemi News Staff

May 18, 2009... Oxford Instruments has launched CrystalFlex, its new multimulti-wafer Hydride Vapour Phase Epitaxy (HVPE) reactor. The company boasts that CrystalFlex provides superb epitaxial growth control and a cost effective method for the production of high quality, crack free epitaxial GaN, AlGaN and AlN single crystal materials. Oxford Instruments notes that the new system is designed for R&D or full scale production of Group III nitrides. According to the company, the focus of the new system is on process stability, reproducibility, and optimal source materials usage. CrystalFlex can grow a variety of Group III nitrides with various thicknesses with its flexible reactor configuration.

Bernard Scanlan, General Manager of Oxford Instruments, commented, “This product launch is a natural progression for Oxford Instruments. Our acquisition in 2008 of TDI and its highly qualified team of research scientists, together with Oxford Instruments development scientists and top level technological expertise, provide a unique platform from which to develop this reactor. Its flexibility means that it is capable of both R&D and full scale production. We are confident that CrystalFlex’s superior features are the keys for the commercialization of optoelectronic and electronic products for Solid State Lighting, RF and power electronics industries." Oxford Instruments News Release

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