MOCVD/MBE Related and Other Processing Equipment – CS/SSLnet

BluGlass Helps Seren Photonics Transfer Semi-Polar GaN Template Process to MOCVD Platform

Australian firm BluGlass Limited has successfully facilitated for its customer, Seren Photonics Limited, the transfer of their GaN template process to the BluGlass MOCVD platform. Seren Photonics of the UK develops semi-polar gallium nitride (GaN) products. Since November 2016, BluGlass has been working with Seren (BluGlass News Release) with the …

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Veeco Acquisition of Ultratech Completed

Veeco Instruments Inc., a supplier of advanced thin film etch and deposition process equipment based in Plainview, New York USA, reported the completion of its acquisition of Ultratech, Inc (Ref: Coverage). Ultratech based in San Jose, California provides lithography, laser-processing and inspection systems for the fabrication of semiconductor devices and LEDs. …

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Hua Hong Semiconductor Introduces Third Generation SJNFET Process Platform

Hua Hong Semiconductor Limited of Hong Kong, a pure-play 200mm foundry, reports that it has concluded the Stage I of its R&D for the third-generation Super Junction MOSFET (SJNFET) process platform. The company plans to introduce its process platform to the market gradually during the first half of 2017. Hua …

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Team Demonstrates Room Temperature ALD and Etching

A University of Colorado, Boulder (CU) team recently devised a new method for room temperature ALD. They created the procedure known as electron-enhanced atomic layer deposition (EE-ALD), as part of DARPA’s Local Control of Materials Synthesis (LoCo) program. The CU team proved room-temperature deposition for both silicon and gallium nitride, …

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BluGlass and HC SemiTek Collaborate on LEDs

BluGlass Limited of Australia reported that it will partner with HC SemiTek, a Chinese LED chip manufacturer. BluGlass and HC SemiTek will collaborate to explore low-temperature deposition of Aluminum Nitride (AlN) for use in high brightness LEDs and review the RPCVD advantages for the fabrication of green LEDs. Through the …

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Corial Offers ICP Process for Etching 6″ Patterned Sapphire Substrate Wafers

Corial of Bernin, France, has made available its ICP (inductively coupled plasma) process to etch 6″ patterned sapphire substrate wafers. Corial says that the ICP process can be used in high-volume LED production with the company’s fully automated PS200 single-module platform. The patterned sapphire substrate (PSS) is the LED industry standard …

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MOCVD Fabs can Now USE New k-Space Ex-situ Characterization Tool

k-Space Associates, Inc has introduced the kSA Emissometer. The Emissometer is an ex-situ tool that offers MOCVD fabs essential wafer carrier characterization, including emissivity, uniformity, and defect identification.   After bakes and between runs, traditional MOCVD fabs perform subjective human test inspections of the quality of wafer carriers. The fabs usually …

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