Picosun Oy, a supplier of Atomic Layer Deposition (ALD) technology based in Espoo, Finland, now offers a system for production-scale aluminum nitride batch processing. The company says that its aluminum nitride (AlN) ALD system offers superior film thickness uniformity and fast speed.
Picosun points out that the compatibility of AlN with other III-V -semiconductors makes it an excellent material for power electronics. The company also notes that in mobile communications several key components such as RF filters and microphones are often based on AlN semiconductor technology.
Furthermore, Picosun contends that the quality of the thin films, especially their uniformity and purity, is crucial in all semiconductor applications. The films must be produced quickly and cost-efficiently in large batches for the end products prices to stay competitive.
“We have achieved excellent results in our new AlN batch process, so we are very happy now to offer it to our industry customers for mass manufacturing applications,” said Dr. Erik Østreng, Applications and Services Director of Picosun.
“We at Picosun want to offer our customers comprehensive, turn-key ALD manufacturing solutions and the best and most agile customer care. A process, tailored, optimized and ramped-up for each customer’s individual needs is the core part of this solution,” continued Mr. Juhana Kostamo, Managing Director of Picosun.
Picosun says its SEMI S2 compliant batch ALD tools equipped with fully automatic substrate handling under a constant vacuum have achieved excellent AlN film thickness uniformity and conformity across the batches.